Ion-solid interactions : fundamentals and applications / Michael Nastasi, James W. Mayer, and James K. Hirvonen.
Nastasi, Michael Anthony, 1950-| Call Number | 530.4/16 |
| Author | Nastasi, Michael Anthony, 1950- author. |
| Title | Ion-solid interactions : fundamentals and applications / Michael Nastasi, James W. Mayer, and James K. Hirvonen. |
| Physical Description | 1 online resource (xxvi, 540 pages) : digital, PDF file(s). |
| Series | Cambridge solid state science series |
| Notes | Title from publisher's bibliographic system (viewed on 05 Oct 2015). |
| Contents | General features and fundamental concepts -- Interatomic potentials -- Dynamics of binary elastic collisions -- Cross-section -- Ion stopping -- Ion range and range distribution -- Radiation damage and spikes -- Ion-solid simulations and diffusion -- Sputtering -- Order-disorder and ion implantation metallurgy -- Ion beam mixing -- Phase transformations -- Ion beam assisted deposition -- Applications of ion beam processing techniques -- Appendix A: Crystallography -- Appendix B: Table of the elements -- Appendix C: Density of states -- Appendix D: Derivation of the Thomas-Fermi differential equation -- Appendix E: Center-of-mass and laboratory scattering angles -- Appendix F: Miedema's semi-empirical model for the enthalpy of formation in the liquid and solid states -- Appendix G: Implantation metallurgy -- study of equilibrium alloys. |
| Summary | Modern technology depends on materials with precisely controlled properties. Ion beams are a favoured method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition to integrated circuit technology, ion beams are used to modify the mechanical, tribological and chemical properties of metal, intermetallic and ceramic materials without altering their bulk properties. Ion–solid interactions are the foundation that underlies the broad application of ion beams to the modification of materials. This text is designed to cover the fundamentals and applications of ion–solid interactions and is aimed at graduate students and researchers interested in electronic devices, surface engineering, reactor and nuclear engineering and material science issues associated with metastable phase synthesis. |
| Added Author | Mayer, James W., 1930- author. Hirvonen, J. K. 1943- author. |
| Subject | Solids Effect of radiation on. ION BOMBARDMENT. Ion implantation Industrial applications. |
| Multimedia |
Total Ratings:
0
03492nam a22004338i 4500
001
vtls001584526
003
VRT
005
20200921121900.0
006
m|||||o||d||||||||
007
cr||||||||||||
008
200921s1996||||enk o ||1 0|eng|d
020
$a 9780511565007 (ebook)
020
$z 9780521373760 (hardback)
020
$z 9780521616065 (paperback)
035
$a (UkCbUP)CR9780511565007
039
9
$y 202009211219 $z santha
040
$a UkCbUP $b eng $e rda $c UkCbUP
050
0
0
$a QC176.8.R3 $b N35 1996
082
0
0
$a 530.4/16 $2 20
100
1
$a Nastasi, Michael Anthony, $d 1950- $e author.
245
1
0
$a Ion-solid interactions : $b fundamentals and applications / $c Michael Nastasi, James W. Mayer, and James K. Hirvonen.
264
1
$a Cambridge : $b Cambridge University Press, $c 1996.
300
$a 1 online resource (xxvi, 540 pages) : $b digital, PDF file(s).
336
$a text $b txt $2 rdacontent
337
$a computer $b c $2 rdamedia
338
$a online resource $b cr $2 rdacarrier
490
1
$a Cambridge solid state science series
500
$a Title from publisher's bibliographic system (viewed on 05 Oct 2015).
505
0
0
$g Ch. 1. $t General features and fundamental concepts -- $g Ch. 2. $t Interatomic potentials -- $g Ch. 3. $t Dynamics of binary elastic collisions -- $g Ch. 4. $t Cross-section -- $g Ch. 5. $t Ion stopping -- $g Ch. 6. $t Ion range and range distribution -- $g Ch. 7. $t Radiation damage and spikes -- $g Ch. 8. $t Ion-solid simulations and diffusion -- $g Ch. 9. $t Sputtering -- $g Ch. 10. $t Order-disorder and ion implantation metallurgy -- $g Ch. 11. $t Ion beam mixing -- $g Ch. 12. $t Phase transformations -- $g Ch. 13. $t Ion beam assisted deposition -- $g Ch. 14. $t Applications of ion beam processing techniques -- $t Appendix A: Crystallography -- $t Appendix B: Table of the elements -- $t Appendix C: Density of states -- $t Appendix D: Derivation of the Thomas-Fermi differential equation -- $t Appendix E: Center-of-mass and laboratory scattering angles -- $t Appendix F: Miedema's semi-empirical model for the enthalpy of formation in the liquid and solid states -- $t Appendix G: Implantation metallurgy -- study of equilibrium alloys.
520
$a Modern technology depends on materials with precisely controlled properties. Ion beams are a favoured method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition to integrated circuit technology, ion beams are used to modify the mechanical, tribological and chemical properties of metal, intermetallic and ceramic materials without altering their bulk properties. Ion–solid interactions are the foundation that underlies the broad application of ion beams to the modification of materials. This text is designed to cover the fundamentals and applications of ion–solid interactions and is aimed at graduate students and researchers interested in electronic devices, surface engineering, reactor and nuclear engineering and material science issues associated with metastable phase synthesis.
650
0
$a Solids $x Effect of radiation on.
650
0
$a ION BOMBARDMENT.
650
0
$a Ion implantation $x Industrial applications.
700
1
$a Mayer, James W., $d 1930- $e author.
700
1
$a Hirvonen, J. K. $q (James Karsten), $d 1943- $e author.
776
0
8
$i Print version: $z 9780521373760
830
0
$a Cambridge solid state science series.
856
4
0
$u https://doi.org/10.1017/CBO9780511565007
999
$a VIRTUA
No Reviews to Display
| Summary | Modern technology depends on materials with precisely controlled properties. Ion beams are a favoured method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition to integrated circuit technology, ion beams are used to modify the mechanical, tribological and chemical properties of metal, intermetallic and ceramic materials without altering their bulk properties. Ion–solid interactions are the foundation that underlies the broad application of ion beams to the modification of materials. This text is designed to cover the fundamentals and applications of ion–solid interactions and is aimed at graduate students and researchers interested in electronic devices, surface engineering, reactor and nuclear engineering and material science issues associated with metastable phase synthesis. |
| Notes | Title from publisher's bibliographic system (viewed on 05 Oct 2015). |
| Contents | General features and fundamental concepts -- Interatomic potentials -- Dynamics of binary elastic collisions -- Cross-section -- Ion stopping -- Ion range and range distribution -- Radiation damage and spikes -- Ion-solid simulations and diffusion -- Sputtering -- Order-disorder and ion implantation metallurgy -- Ion beam mixing -- Phase transformations -- Ion beam assisted deposition -- Applications of ion beam processing techniques -- Appendix A: Crystallography -- Appendix B: Table of the elements -- Appendix C: Density of states -- Appendix D: Derivation of the Thomas-Fermi differential equation -- Appendix E: Center-of-mass and laboratory scattering angles -- Appendix F: Miedema's semi-empirical model for the enthalpy of formation in the liquid and solid states -- Appendix G: Implantation metallurgy -- study of equilibrium alloys. |
| Subject | Solids Effect of radiation on. ION BOMBARDMENT. Ion implantation Industrial applications. |
| Multimedia |