Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions / edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.

Call Number
530.44 H19-
Title
Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions / edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.
Publication
Norwich, New York, U.S.A. : Noyes Publications, c1990.
Physical Description
xxiii, 523 p. : il. ; 25 cm.
Series
Materials science and process technology series
Added Author
Rossnagel, Stephen M.
Cuomo, Jerome J.
Westwood, William D. 1937-
Subject
Plasma engineering.
Semiconductors Etching.
PLASMA ETCHING.
Ingeniería del plasma.
Semiconductores Ataque químico.
Plasma Erosión selectiva.
Total Ratings: 0
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$a xxiii, 523 p. : $b il. ; $c 25 cm.
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$a Materials science and process technology series
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$a Incluye referencias bibliográficas e índice.
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$a Plasma engineering.
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$a Semiconductors $x Etching.
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$a PLASMA ETCHING.
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$a Ingeniería del plasma.
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$a Semiconductores $x Ataque químico.
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$a Plasma $x Erosión selectiva.
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$a Rossnagel, Stephen M.
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$a Westwood, William D. $q (William Dickson), $d 1937-
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No Reviews to Display
Subject
Plasma engineering.
Semiconductors Etching.
PLASMA ETCHING.
Ingeniería del plasma.
Semiconductores Ataque químico.
Plasma Erosión selectiva.