Dielectric films for advanced microelectronics edited by Mikhail Baklanov, Martin Green, and Karen Maex.
Baklanov,M| Call Number | 621.381 B17D |
| Author | Baklanov,M |
| Title | Dielectric films for advanced microelectronics edited by Mikhail Baklanov, Martin Green, and Karen Maex. |
| Publication | Chichester, England ; Hoboken, NJ : John Wiley & Sons, c2007. |
| Physical Description | xxii, 486 p. : ill. ; 26 cm. |
| Series | Wiley series in materials for electronic and optoelectronic applications |
| Contents | Low and ultralow dielectric constant films prepared by plasma-enhanced chemical vapor deposition / Spin-on dielectric materials / Positron annihilation spectroscopy / Structure characterization of nanoporous interlevel dielectric thin films with x-ray and neutron radiation / Ellipsometric porosimetry / Mechanical and transport properties of low-k dielectrics / Integration of low-k dielectric films in damascene processes / ONO structures and oxynitrides in modern microelectronics : material science, characterization and application / Material engineering of high-k gate dielectrics / Physical characterization of ultra-thin high-k dielectric / Electrical characterization of advanced gate dielectrics / Integration issues of high-k gate dielectrics / Anisotropic conductive film (ACF) for advanced microelectronic interconnects / |
| Added Author | Baklanov, Mikhail. Green, Martin. Maex, Karen. |
| Subject | DIELECTRIC FILMS. Microelectronics Materials. |
| Multimedia |
Total Ratings:
0
03084cam a2200433 a 4500
001
vtls001470242
003
VRT
005
20080216103200.0
008
080216s2007 enka b 001 0 eng
010
$a 2006-030740
015
$a GBA689828 $2 bnb
016
7
$a 013583888 $2 Uk
020
$a 9780470013601 (hbk.)
020
$a 0470013605 (hbk.)
029
1
$a YDXCP $b 100451869
039
9
$a 200802161032 $b mm $y 200710301024 $z srinu
049
$a IIUOH
082
0
0
$a 621.381 $b B17D
100
$a Baklanov,M
245
0
0
$a Dielectric films for advanced microelectronics $c edited by Mikhail Baklanov, Martin Green, and Karen Maex.
260
$a Chichester, England ; $a Hoboken, NJ : $b John Wiley & Sons, $c c2007.
300
$a xxii, 486 p. : $b ill. ; $c 26 cm.
440
0
$a Wiley series in materials for electronic and optoelectronic applications
504
$a Includes bibliographical references and index.
505
0
0
$t Low and ultralow dielectric constant films prepared by plasma-enhanced chemical vapor deposition / $r A. Grill -- $t Spin-on dielectric materials / $r Geraud Dubois, Robert D. Miller, Willi Volksen -- $t Positron annihilation spectroscopy / $r David W. Gidley, Hua-Gen Peng, Richard Vallery -- $t Structure characterization of nanoporous interlevel dielectric thin films with x-ray and neutron radiation / $r Christopher L. Soles ... [et al.] -- $t Ellipsometric porosimetry / $r Mikhail R. Baklanov -- $t Mechanical and transport properties of low-k dielectrics / $r J. L. Plawsky ... [et al.] -- $t Integration of low-k dielectric films in damascene processes / $r R. J. O. M. Hoofman ... [et al.] -- $t ONO structures and oxynitrides in modern microelectronics : material science, characterization and application / $r Yakov Roizin, Vladimir Gritsenko -- $t Material engineering of high-k gate dielectrics / $r Akira Toriumi, Koji Kita -- $t Physical characterization of ultra-thin high-k dielectric / $r T. Conard, H. Bender, W. Vandervorst -- $t Electrical characterization of advanced gate dielectrics / $r Robin Degraeve ... [et al.] -- $t Integration issues of high-k gate dielectrics / $r Yasuo Nara -- $t Anisotropic conductive film (ACF) for advanced microelectronic interconnects / $r Yi Li, C. P. Wong.
650
0
$a DIELECTRIC FILMS.
650
0
$a Microelectronics $x Materials.
700
1
$a Baklanov, Mikhail.
700
1
$a Green, Martin.
700
1
$a Maex, Karen.
856
4
1
$3 Table of contents only $u http://www.loc.gov/catdir/toc/ecip071/2006030740.html
856
4
2
$3 Contributor biographical information $u http://www.loc.gov/catdir/enhancements/fy0739/2006030740-b.html
856
4
2
$3 Publisher description $u http://www.loc.gov/catdir/enhancements/fy0739/2006030740-d.html
938
$a YBP Library Services $b YANK $n 100451869
938
$a Baker and Taylor $b BTCP $n BK0007249657
938
$a Baker & Taylor $b BKTY $c 240.00 $d 240.00 $i 0470013605 $n 0006954584 $s active
994
$a C0 $b IIUOH
999
$a VIRTUA
999
$a VTLSSORT0010*0030*0080*0100*0150*0160*0200*0201*0290*0820*0490*1000*2450*2600*3000*4400*5040*5050*6500*6501*7000*7001*7002*8560*8561*8562*9380*9381*9382*9940*9991
No Reviews to Display
| Contents | Low and ultralow dielectric constant films prepared by plasma-enhanced chemical vapor deposition / Spin-on dielectric materials / Positron annihilation spectroscopy / Structure characterization of nanoporous interlevel dielectric thin films with x-ray and neutron radiation / Ellipsometric porosimetry / Mechanical and transport properties of low-k dielectrics / Integration of low-k dielectric films in damascene processes / ONO structures and oxynitrides in modern microelectronics : material science, characterization and application / Material engineering of high-k gate dielectrics / Physical characterization of ultra-thin high-k dielectric / Electrical characterization of advanced gate dielectrics / Integration issues of high-k gate dielectrics / Anisotropic conductive film (ACF) for advanced microelectronic interconnects / |
| Subject | DIELECTRIC FILMS. Microelectronics Materials. |
| Multimedia |