EUV sources for lithography edited by Vivek Bakshi.
Bakshi,Vivek.| Call Number | 621.364 B17E |
| Author | Bakshi,Vivek. |
| Title | EUV sources for lithography edited by Vivek Bakshi. |
| Publication | Washington : SPIE Press, 2006. |
| Physical Description | xxxv, 1057 p. : ill. ; 27 cm. |
| Subject | Ultraviolet radiation Industrial applications. PLASMA (IONIZED GASES) LITHOGRAPHY. |
| Multimedia |
Total Ratings:
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$a EUV sources for lithography $c edited by Vivek Bakshi.
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$a Washington : $b SPIE Press, $c 2006.
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$a xxxv, 1057 p. : $b ill. ; $c 27 cm.
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$a Includes bibliographical references and index.
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$a Ultraviolet radiation $x Industrial applications.
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$a LITHOGRAPHY.
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$3 Table of contents $u http://www.loc.gov/catdir/toc/ecip0518/2005025505.html
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| Subject | Ultraviolet radiation Industrial applications. PLASMA (IONIZED GASES) LITHOGRAPHY. |
| Multimedia |