Sputter etch rates of photoresist OIR 620M and megaposit SPR 220 in ICP RIE by Sachin Kumar Singh; supervised by Guruswamy Rajaram
Singh, Sachin Kumar| Call Number | PR621.381 Si64S |
| Author | Singh, Sachin Kumar |
| Title | Sputter etch rates of photoresist OIR 620M and megaposit SPR 220 in ICP RIE by Sachin Kumar Singh; supervised by Guruswamy Rajaram |
| Publication | Hyderabad: University of Hyderabad, 2019. |
| Physical Description | 41p. |
| Notes | Project Report (M.Tech) - Centre for Advanced Studies in Electronics Science and Technology - School of Physics - University of Hyderabad - 500046. |
| Added Author | Rajaram, Guruswamy supervisor |
| Subject | INTEGRATED CIRCUIT TECHNOLOGY - PROJECT REPORTS |
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| Notes | Project Report (M.Tech) - Centre for Advanced Studies in Electronics Science and Technology - School of Physics - University of Hyderabad - 500046. |
| Subject | INTEGRATED CIRCUIT TECHNOLOGY - PROJECT REPORTS |