Synthesis charecterization and radiation damage studies of high-k dielectric (HfO2) films for MOS device applications by Nimmala Arun; supervised by S.V.S. Nageswara Rao
Arun, Nimmala| Call Number | PR001.535 An84S |
| Author | Arun, Nimmala |
| Title | Synthesis charecterization and radiation damage studies of high-k dielectric (HfO2) films for MOS device applications by Nimmala Arun; supervised by S.V.S. Nageswara Rao |
| Publication | Hyderabad: University of Hyderabad, 2013. |
| Physical Description | 67p. |
| Notes | Project Report (M.Tech) - School of physics - University of Hyderabad |
| Added Author | Nageswara Rao, S.V.S.; supervisor |
| Subject | Integrated Circuit Technology - Project Report |
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| Notes | Project Report (M.Tech) - School of physics - University of Hyderabad |
| Subject | Integrated Circuit Technology - Project Report |