Sub-half-micron lithography for ULSIs / edited by Katsumi Suzuki, Shinji Matsui, and Yukinori Ochiai.
Suzuki, Katsumi, ed.| Call Number | 621.38153 Su99S |
| Author | Suzuki, Katsumi, ed. |
| Title | Sub-half-micron lithography for ULSIs / edited by Katsumi Suzuki, Shinji Matsui, and Yukinori Ochiai. |
| Publication | Cambridge ; New York : Cambridge University Press, 2000. |
| Physical Description | xvii, 323 p. : ill. ; 25 cm. |
| Contents | Optical lithography / Kunihiko Kasama ... [et al.] -- X-ray lithography / Kimiyoshi Deguchi ... [et al.] -- Electron-beam lithography / Takayuki Abe ... [et al.] -- Ion-beam lithography / Masanori Komuro and Shinji Matsui -- Resists / Hiroshi Ban ... [et al.] -- Metrology, defect inspection, and repair / Tadahito Matsuda, Toru Tojo and Seiichi Yabumoto. |
| Added Author | Matsui, Shinji. Ochiai, Yukinori, 1955- |
| Subject | Integrated circuits Ultra large scale integration Design and construction. MICROLITHOGRAPHY. Printed circuits Design and construction. Photolithography. Integrated circuits Ultra large scale integration. |
| Multimedia |
Total Ratings:
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$a Sub-half-micron lithography for ULSIs / $c edited by Katsumi Suzuki, Shinji Matsui, and Yukinori Ochiai.
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$a Cambridge ; $a New York : $b Cambridge University Press, $c 2000.
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$a xvii, 323 p. : $b ill. ; $c 25 cm.
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$a Includes bibliographical references and index.
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$a Optical lithography / Kunihiko Kasama ... [et al.] -- X-ray lithography / Kimiyoshi Deguchi ... [et al.] -- Electron-beam lithography / Takayuki Abe ... [et al.] -- Ion-beam lithography / Masanori Komuro and Shinji Matsui -- Resists / Hiroshi Ban ... [et al.] -- Metrology, defect inspection, and repair / Tadahito Matsuda, Toru Tojo and Seiichi Yabumoto.
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$a Integrated circuits $x Ultra large scale integration $x Design and construction.
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$a MICROLITHOGRAPHY.
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$a Printed circuits $x Design and construction.
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$a Photolithography.
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$a Integrated circuits $x Ultra large scale integration.
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$a Matsui, Shinji.
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$a Ochiai, Yukinori, $d 1955-
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$3 Table of contents $u http://www.loc.gov/catdir/toc/cam027/99013558.html
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| Contents | Optical lithography / Kunihiko Kasama ... [et al.] -- X-ray lithography / Kimiyoshi Deguchi ... [et al.] -- Electron-beam lithography / Takayuki Abe ... [et al.] -- Ion-beam lithography / Masanori Komuro and Shinji Matsui -- Resists / Hiroshi Ban ... [et al.] -- Metrology, defect inspection, and repair / Tadahito Matsuda, Toru Tojo and Seiichi Yabumoto. |
| Subject | Integrated circuits Ultra large scale integration Design and construction. MICROLITHOGRAPHY. Printed circuits Design and construction. Photolithography. Integrated circuits Ultra large scale integration. |
| Multimedia |